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Electrochemical-Etching

Silicon oxide layer can be removed using HF solution.

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This Chapter Electrochemical-Etching consists of the following topics

During post treatment of MpSi, a layer of silicon dioxide is formed.

Silicon oxide layer can be removed using HF solution.

Length of the silicon dioxide pillars is dependant on the etching time and the pore length.

Silicon oxide layer can be removed using HF solution.

Electrochemical Etching

Manufacturing-Engineering-II