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Electrochemical-Etching

The etching rate of silicon wafers under light illumination is much slower than under dark conditions.

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This Chapter Electrochemical-Etching consists of the following topics

Illumination of light in metal-assisted etching of silicon affects the etching rate.

The etching rate of silicon wafers under light illumination is much slower than under dark conditions.

The faster etch rates of the silicon wafer under light illumination is due to photo-excited electronic holes.

The etching rate of silicon wafers under light illumination is much slower than under dark conditions.

Electrochemical Etching

Manufacturing-Engineering-II